Photolithography Mask (3 ~ 9 inch)

Photomask (Photomask Plate)

also known as optical mask, photolithography mask, or lithographic template, is the master pattern used in the photolithography process for microelectronics and integrated optoelectronics manufacturing.

Common sizes range from 3 to 9 inches, and typical materials include soda-lime glass and quartz glass.

Different specifications have variations in size and thickness, and must be customized according to user requirements.

The opaque areas are usually made of chromium, hence the common name "chrome mask."

The chromium layer is approximately 0.1 μm thick and is used as a high-precision photomask in chip fabrication.